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Aberration-corrected Imaging in Transmission Electron Microscopy: An Introduction, by Rolf Erni

Aberration-corrected Imaging in Transmission Electron Microscopy: An Introduction, by Rolf Erni



Aberration-corrected Imaging in Transmission Electron Microscopy: An Introduction, by Rolf Erni

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Aberration-corrected Imaging in Transmission Electron Microscopy: An Introduction, by Rolf Erni

This book provides a concise introduction to practical aspects of atomic-resolution imaging in aberration-corrected electron microscopy. As such, it addresses recent advances in electron optical instrumentation used for ultra-high resolution imaging in materials and nano-science. It covers two of the most popular atomic resolution imaging techniques' namely high-resolution transmission electron microscopy and scanning transmission electron microscopy. The book bridges the gap between application-oriented textbooks in conventional electron microscopy and books in physics covering dedicated topics in charged-particle optics and aberration correction.

The book is structured in three parts which can be read separately. While in the first part the fundamentals of the imaging techniques and their limits in conventional electron microscopes are explained, the second part provides readers with the basic principles of electron optics and the characteristics of electron lenses. The third part, focusing on aberrations, describes the functionality of aberration correctors and provides readers with practical guidelines for the daily work with aberration-corrected electron microscopes. The book represents a detailed and easy readable guide to aberration-corrected electron microscopy.

  • Sales Rank: #665539 in Books
  • Published on: 2010-08-30
  • Original language: English
  • Number of items: 1
  • Dimensions: 9.80" h x .80" w x 6.60" l, 1.70 pounds
  • Binding: Hardcover
  • 348 pages

Review
Aberration-Corrected Imaging in Transmission Electron Microscopy is impeccably edited. The schematic diagrams are accurate and informative. The equations presented are necessary and sufficient ... Practical aberration-corrected instruments have been a long time coming but are still very expensive. Researchers who are fortunate enough to acquire one should also acquire a copy of Aberration-Corrected Imaging in Transmission Electron Microscopy. --Physics Today

From the Inside Flap
This book provides a concise introduction to practical aspects of atomic-resolution imaging in aberration-corrected electron microscopy. As such, it addresses recent advances in electron optical instrumentation used for ultra-high resolution imaging in materials and nano-science. It covers two of the most popular atomic resolution imaging techniques' namely high-resolution transmission electron microscopy and scanning transmission electron microscopy. The book bridges the gap between application-oriented textbooks in conventional electron microscopy and books in physics covering dedicated topics in charged-particle optics and aberration correction.

The book is structured in three parts which can be read separately. While in the first part the fundamentals of the imaging techniques and their limits in conventional electron microscopes are explained, the second part provides readers with the basic principles of electron optics and the characteristics of electron lenses. The third part, focusing on aberrations, describes the functionality of aberration correctors and provides readers with practical guidelines for the daily work with aberration-corrected electron microscopes. The book represents a detailed and easy readable guide to aberration-corrected electron microscopy.

About the Author
Rolf Erni is currently the head of Electron Microscopy Center, Swiss Federal Laboratories for Materials Testing and Research (Empa), Dübendorf, Switzerland (starting 2009. He was the staff scientist at the National Center for Electron Microscopy, Lawrence Berkeley National Laboratory, USA (2007-2009). Rolf Erni received his doctoral degree from the Swiss Federal Institute of Technology Zurich (ETH Zurich) at the Institute of Applied Physics. He carried out postdoctoral studies at the University of California at Davis and at the National Center for Electron Microscopy (NCEM), Lawrence Berkeley National Laboratory.

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